Advanced Technologies Based on Wave and Beam Generated Plasmas (NATO Science Partnership Subseries: 3, 67, Band 67) - gebonden uitgave, pocketboek

EAN (ISBN-13): 9780792356424
ISBN (ISBN-10): 079235642X
Gebonden uitgave
pocket book
Verschijningsjaar: 1999
Uitgever: Schlüter, H. Shivarova, A. Springer
588 Bladzijden
Gewicht: 1,029 kg
Taal: eng/Englisch

Boek bevindt zich in het datenbestand sinds 2007-10-19T17:18:06+02:00 (Amsterdam)
Detailpagina laatst gewijzigd op 2024-03-19T12:43:49+01:00 (Amsterdam)
ISBN/EAN: 9780792356424

ISBN - alternatieve schrijfwijzen:
0-7923-5642-X, 978-0-7923-5642-4
alternatieve schrijfwijzen en verwante zoekwoorden:
Auteur van het boek: schlã ter, schla, schlüter, schluter
Titel van het boek: sozopol, advanced technologies based wave beam generated plasmas, advanced plasma technology, last wave, the wave

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Gegevens van de uitgever

Auteur: H. Schlüter; A. Shivarova
Titel: NATO Science Partnership Subseries: 3; Advanced Technologies Based on Wave and Beam Generated Plasmas
Uitgeverij: Springer; Springer Netherland
569 Bladzijden
Verschijningsjaar: 1999-02-28
Dordrecht; NL
Taal: Engels
213,99 € (DE)
219,99 € (AT)
236,00 CHF (CH)
Available
XIII, 569 p. 98 illus.

BB; Hardcover, Softcover / Physik, Astronomie/Atomphysik, Kernphysik; Atom- und Molekularphysik; Verstehen; Dusty plasma; Plasma; chemistry; electronics; laser; laser physics; optics; surface; Nuclear Physics; Condensed Matter Physics; Spectroscopy; Surfaces, Interfaces and Thin Film; Physik der kondensierten Materie (Flüssigkeits- und Festkörperphysik); Spektroskopie, Spektrochemie, Massenspektrometrie; Materialwissenschaft; BC; EA

1: Lectures.- Plasma Discharges for Materials Processing and Display Applications.- The Development and Use of Surface-Wave Sustained Discharges for Applications.- Electrodeless Gas Discharges for Lighting.- Plasma Production above Multipolar Magnetic Field Structures: from DC Magnetrons to Distributed ECR.- ECR Plasmas for Thin-Film Deposition.- Deposition Properties and Applications of Carbon-Based Coatings.- Substrate Biasing during Plasma Processing: Interest, Methods and Limitations.- Ion Energy Distributions.- Dusty Plasmas: Fundamental Aspects and Industrial Applications.- Plasma Based Ion Implantation.- Waveguide Stationary and Nonstationary Discharges: Modelling and Experiments.- Nonuniformity Aspects in Modelling and Noncollisional Heating of HF Discharges.- Travelling Wave Discharges in Nitrogen: Modelling and Experiment.- Atmospheric Pressure Discharges: Travelling Wave Plasma Sources.- Modelling of Atmospheric Pressure Microwave Sustained Discharges.- Long Microwave Discharges.- Waves in Bounded Magnetized Plasmas.- Electron Beam Generated Plasmas: Theory, Experiments, Applications.- EBIT: An Electron. Beam Source for the Production and Confinement of Highly Ionized Atoms.- 2: Posters.- The Anisotropie Etching of Silicon in CF4, CF4 + H2 and CF4?xClx Plasma.- CF2 Production by CF4 Electron Impact Dissociation in Gas Discharge.- On Negative Ions Langmuir Probe Measurements in an Ar + 4% CF4 Currentless Plasma.- Plasma Treatment of Polymer Surfaces in Different Gases.- Plasma Treatment of Polymer Surfaces in Gas Mixture.- Field Emission Characteristics of Thin MPCVD Diamond Films.- Technological Method of Substratum Metallization by Plasma-Arc Deposition.- Hydrodynamic and Electrical Characterization of Corona Discharge Plasma Reactor.- Study by MassSpectrometry and Gas Chromatography of Fluorocarbon Waste Destruction in a Low-Pressure Plasma Reactor.- CARS Applied to Plasmas for NO-Reduction.- Heating and Melting of the Dust Crystal in a RF Discharge. Non-Linear Analysis.- Intense Plasma Pulses in Doping, Coating and Glazing the Surface of Solid Materials.- Monoatomic Ion Rich DECR Plasmas for Ion Implantation by Plasma Immersion Using a New High Voltage-High Current Pulse Generator.- Spatial Distribution and Kinetics of Negative Ions in Glow DC Discharge in Pure O2 and H2.- Diffusion and Wall Loss of Magnesium in Decaying Plasma.- Diffusion and Depopulation of the Metastable Cd3P0,2 States in Collisions with Neon Atoms.- Non-Local Regime of Self-Consistency in Stationary Waveguided Discharges.- Symmetric Mode in a Planar Plasma Waveguide: Numerical Study of Nonlinear Effects.- Modulation Instabilities of Surface-Wave Sustained Discharges.- Correlation and Spectrum Analysis of Instabilties in Waveguided Discharges.- Pulsed Surface Wave Sustained Discharges: Modelling.- Pulsed Discharges Produced by Surface Waves in 3-cm Wavelength Band in the Air.- Pulsed Microwave Discharge in Nitrogen: Diagnostics and Modelling.- The Turning Back and the Turning Forward of the Wave Number in Surface Wave Propagation.- Experimental Indications for the Existence of Plasma Resonances in Surface Wave Discharges.- Test Surface Waves as a Diagnostics Tool for SWSD.- Optical Spectroscopy Diagnostics of Waveguided Discharges in a Non-Stationary Regime.- A New Passive Compensation Technique for Probes in Oscillating Electric Fields.- Modelling of Radio Frequency Capacitively Coupled Plasma at Intermediate Pressures.- Two-Dimensional Mapping of the Electron Energy Distribution Function.- Modelling of the Equivalent Circuit of InductivelyCoupled Plasma Sources.- Optical Measurements of Gas Temperature in Microwave Discharge Plasmas in Hydrogen.- Gas Temperature Influence on the Particle Kinetics in a Surface-Wave-Sustained Nitrogen Discharge.- Excited Atoms and Charged Particles Axial Distributions in Argon Microwave Plasmas at Various Gas Pressures.- A Study of Excitation Mechanisms in Atmospheric Microwave Induced Argon Plasmas.- 2D Model for a Microwave Sustained Discharge in Nitrogen at Atmospheric Pressure.- Influence of Ionization Effects on Drift-Dissipative Instability.- Investigation of the Electron Distribution Functions in Low Pressure Electron Cyclotron Resonance Discharges.- Electromagnetic Waves in a Magnetized Plasma Column.- Magnetoplasmons Guided by a Gyrotropic Plasma Layer on a Metal Substrate.- Wave Propagation in a Free Gyrotropic Plasma Layer.- Source of an Annular Controlled Radius Plasma.- Beam-Plasma Instability Effects Supporting Capacitive Low Pressure RF Discharges.- Author Index.