2010, ISBN: 9048146968
[EAN: 9789048146963], New book, [SC: 9.59], [PU: Springer Netherlands Dez 2010], METALL; SEMICONDUCTOR; ELECTRICALENGINEERING; MATERIALSSCIENCE; SEMICONDUCTORS; THINFILM, This item is pri… Meer...
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2010, ISBN: 9789048146963
Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...
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2010, ISBN: 9789048146963
Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...
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2010, ISBN: 9789048146963
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Springer, 2010-12-03. Softcover reprint of hardcover 1. Paperback. Used:Good., Springer, 2010-12-03, 0
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2010, ISBN: 9048146968
[EAN: 9789048146963], New book, [SC: 60.05], [PU: Springer], Books
AbeBooks.co.uk Lucky's Textbooks, Dallas, TX, U.S.A. [60577173] [Rating: 5 (of 5)] NEW BOOK. Verzendingskosten: EUR 60.05 Details... |
2010, ISBN: 9048146968
[EAN: 9789048146963], New book, [SC: 9.59], [PU: Springer Netherlands Dez 2010], METALL; SEMICONDUCTOR; ELECTRICALENGINEERING; MATERIALSSCIENCE; SEMICONDUCTORS; THINFILM, This item is pri… Meer...
2010, ISBN: 9789048146963
Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...
2010
ISBN: 9789048146963
Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...
2010, ISBN: 9789048146963
gebonden uitgave
Springer, 2010-12-03. Softcover reprint of hardcover 1. Paperback. Used:Good., Springer, 2010-12-03, 0
2010, ISBN: 9048146968
[EAN: 9789048146963], New book, [SC: 60.05], [PU: Springer], Books
Bibliografische gegevens van het best passende boek
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Gedetalleerde informatie over het boek. - Advances in Rapid Thermal and Integrated Processing (NATO Science Series E:, 318)
EAN (ISBN-13): 9789048146963
ISBN (ISBN-10): 9048146968
Gebonden uitgave
pocket book
Verschijningsjaar: 2010
Uitgever: Springer
580 Bladzijden
Gewicht: 0,865 kg
Taal: eng/Englisch
Boek bevindt zich in het datenbestand sinds 2012-11-07T18:53:56+01:00 (Amsterdam)
Detailpagina laatst gewijzigd op 2023-11-23T23:55:55+01:00 (Amsterdam)
ISBN/EAN: 9789048146963
ISBN - alternatieve schrijfwijzen:
90-481-4696-8, 978-90-481-4696-3
alternatieve schrijfwijzen en verwante zoekwoorden:
Titel van het boek: rapid
Gegevens van de uitgever
Auteur: F. Roozeboom
Titel: NATO Science Series E:; Advances in Rapid Thermal and Integrated Processing
Uitgeverij: Springer; Springer Netherland
566 Bladzijden
Verschijningsjaar: 2010-12-04
Dordrecht; NL
Gedrukt / Gemaakt in
Gewicht: 0,878 kg
Taal: Engels
427,99 € (DE)
439,99 € (AT)
472,00 CHF (CH)
POD
XII, 566 p.
BC; Solid State Physics; Hardcover, Softcover / Physik, Astronomie/Atomphysik, Kernphysik; Physik der kondensierten Materie (Flüssigkeits- und Festkörperphysik); Verstehen; Metall; Semiconductor; electrical engineering; materials science; semiconductors; thin film; Spectroscopy and Microscopy; Optical and Electronic Materials; Characterization and Evaluation of Materials; Condensed Matter Physics; Spectroscopy; Optical Materials; Characterization and Analytical Technique; Spektroskopie, Spektrochemie, Massenspektrometrie; Technische Anwendung von elektronischen, magnetischen, optischen Materialien; Werkstoffprüfung; BB
Preface. 1. Introduction: History and Perspectives of Rapid Thermal Processing; F. Roozeboom. 2. The Thermal Radiative Properties of Semiconductors; P.J. Timans. 3. Wafer Temperature Measurement in RTP; C. Schietinger. 4. Wafer Emissivity in RTP; C. Schietinger. 5. Temperature and Process Control in Rapid Thermal Processing; J.-M. Dilhac. 6. Single-Wafer Process Integration and Process Control Techniques; M.M. Moslehi, et al. 7. Rapid Thermal O2-Oxidation and N2-Oxynitridation; M.L. Green. 8. Integrated Pre-Gate Dielectric Cleaning and Surface Preparation; Y. Ma, M.L. Green. 9. Dielectric Photoformation on Si and SiGe; I.W. Boyd. 10. Modeling Strategies for Rapid Thermal Processing: Finite Element and Monte Carlo Methods; K.F Jensen, et al. 11. Modeling Approaches for Rapid Thermal Chemical Vapor Deposition: Combining Transport Phenomena with Chemical Kinetics; K.F. Jensen, et al. 12. Silicidation and Metallization Issues Using Rapid Thermal Processing; K. Maex. 13. Rapid Thermal Multiprocessing for a Programmable Factory for Manufacturing of ICs; K.C. Saraswat. 14. RTCVD Integrated Processing for Photovoltaic Application; E. Conrad, et al. 15. Equipment Design, Cluster Tools and Scale-up Issues; L. Deutschmann, et al. 16. Rapid Thermal Chemical Vapour Deposition of Epitaxial Si and SiGe: Low Temperature Epitaxy in Production; W.B. de Boer. 17. The Evolving Role of Rapid Thermal Processing for Deep Submicron Devices; B. Lojek. 18. Rapid Thermal Processing of Contacts and Buffer Layers for Compound Semiconductor Device Technology; A. Christou, et al. 19. Rapid Thermal Processing of Magnetic Thin Films for Data Storage Devices; F. Roozeboom. Appendix. Subject Index.Proceedings of the NATO Advanced Study Institute, Acquafredda di Maratea, Italy, July 3-14, 1995
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Laatste soortgelijke boek:
9789401587112 Advances in Rapid Thermal and Integrated Processing (F. Roozeboom)
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