2010, ISBN: 9048146968
[EAN: 9789048146963], New book, [SC: 9.59], [PU: Springer Netherlands Dez 2010], METALL; SEMICONDUCTOR; ELECTRICALENGINEERING; MATERIALSSCIENCE; SEMICONDUCTORS; THINFILM, This item is pri… Meer...
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2010, ISBN: 9789048146963
Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...
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2010, ISBN: 9789048146963
Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...
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2010, ISBN: 9789048146963
gebonden uitgave
Springer, 2010-12-03. Softcover reprint of hardcover 1. Paperback. Used:Good., Springer, 2010-12-03, 0
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2010, ISBN: 9048146968
[EAN: 9789048146963], New book, [SC: 60.05], [PU: Springer], Books
AbeBooks.co.uk Lucky's Textbooks, Dallas, TX, U.S.A. [60577173] [Rating: 5 (of 5)] NEW BOOK. Verzendingskosten: EUR 60.05 Details... |
2010, ISBN: 9048146968
[EAN: 9789048146963], New book, [SC: 9.59], [PU: Springer Netherlands Dez 2010], METALL; SEMICONDUCTOR; ELECTRICALENGINEERING; MATERIALSSCIENCE; SEMICONDUCTORS; THINFILM, This item is pri… Meer...
2010, ISBN: 9789048146963
Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...
2010
ISBN: 9789048146963
Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...
2010, ISBN: 9789048146963
gebonden uitgave
Springer, 2010-12-03. Softcover reprint of hardcover 1. Paperback. Used:Good., Springer, 2010-12-03, 0
2010, ISBN: 9048146968
[EAN: 9789048146963], New book, [SC: 60.05], [PU: Springer], Books
Bibliografische gegevens van het best passende boek
auteur: | |
Titel: | |
ISBN: |
Gedetalleerde informatie over het boek. - Advances in Rapid Thermal and Integrated Processing (NATO Science Series E:, 318)
EAN (ISBN-13): 9789048146963
ISBN (ISBN-10): 9048146968
Gebonden uitgave
pocket book
Verschijningsjaar: 2010
Uitgever: Springer
580 Bladzijden
Gewicht: 0,865 kg
Taal: eng/Englisch
Boek bevindt zich in het datenbestand sinds 2012-11-07T18:53:56+01:00 (Amsterdam)
Detailpagina laatst gewijzigd op 2023-11-23T23:55:55+01:00 (Amsterdam)
ISBN/EAN: 9789048146963
ISBN - alternatieve schrijfwijzen:
90-481-4696-8, 978-90-481-4696-3
alternatieve schrijfwijzen en verwante zoekwoorden:
Titel van het boek: rapid
Gegevens van de uitgever
Auteur: F. Roozeboom
Titel: NATO Science Series E:; Advances in Rapid Thermal and Integrated Processing
Uitgeverij: Springer; Springer Netherland
566 Bladzijden
Verschijningsjaar: 2010-12-04
Dordrecht; NL
Gedrukt / Gemaakt in
Taal: Engels
427,99 € (DE)
439,99 € (AT)
472,00 CHF (CH)
POD
XII, 566 p.
BC; Hardcover, Softcover / Physik, Astronomie/Atomphysik, Kernphysik; Physik der kondensierten Materie (Flüssigkeits- und Festkörperphysik); Verstehen; Metall; Semiconductor; electrical engineering; materials science; semiconductors; thin film; Condensed Matter Physics; Spectroscopy; Optical Materials; Characterization and Analytical Technique; Spektroskopie, Spektrochemie, Massenspektrometrie; Technische Anwendung von elektronischen, magnetischen, optischen Materialien; Werkstoffprüfung; BB
1. Introduction: history and perspectives of Rapid Thermal Processing.- 2. The thermal radiative properties of semiconductors.- 3. Wafer temperature measurement in RTP.- 4. Wafer emissivity in RTP.- 5. Temperature and process control in Rapid Thermal Processing.- 6. Single-wafer process integration and process control techniques.- 7. Rapid Thermal O2-oxidation and N2O-oxynitridation.- 8. Integrated pre-gate dielectric cleaning and surface preparation.- 9. Dielectric photoformation on Si and SiGe.- 10. Modeling strategies for Rapid Thermal Processing: finite element and Monte Carlo methods.- 11. Modeling approaches for Rapid Thermal Chemical Vapor Deposition: combining transport phenomena with chemical kinetics.- 12. Silicidation and metallization issues using Rapid Thermal Processing.- 13. Rapid Thermal Multiprocessing for a programmable factory for manufacturing of ICs.- 14. RTCVD integrated processing for photovoltaic application.- 15. Equipment design, cluster tools and scale-up issues.- 16. Rapid Thermal Chemical Vapor Deposition of epitaxial Si and SiGe.- 17. The evolving role of Rapid Thermal Processing for deep submicron devices.- 18. Rapid Thermal Processing of contacts and buffer layers for compound semiconductor device technology.- 19. Rapid Thermal Processing of magnetic thin films for data storage devices.- Appendix List of ASI participants.Andere boeken die eventueel grote overeenkomsten met dit boek kunnen hebben:
Laatste soortgelijke boek:
9789401587112 Advances in Rapid Thermal and Integrated Processing (F. Roozeboom)
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