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Principles of Chemical Vapor Deposition - D.m. Dobkin, M.K. Zuraw
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D.m. Dobkin, M.K. Zuraw:

Principles of Chemical Vapor Deposition - nieuw boek

ISBN: 9789048162772

Do you work with chemical Vapor deposition processes or reactors? Have you ever wondered what goes on inside the chamber or how the deposition processes work? If the answer to this is yes… Meer...

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Dobkin, D. M. / Zuraw, M. K.:

Principles of Chemical Vapor Deposition - gebruikt boek

ISBN: 9789048162772

Do you work with chemical Vapor deposition processes or reactors? Have you ever wondered what goes on inside the chamber or how the deposition processes work? If the answer to this is yes… Meer...

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Principles of Chemical Vapor Deposition - D.M. Dobkin; M.K. Zuraw
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D.M. Dobkin; M.K. Zuraw:
Principles of Chemical Vapor Deposition - pocketboek

ISBN: 9789048162772

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the b… Meer...

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Daniel M. Dobkin:
Principles of Chemical Vapor Deposition - pocketboek

ISBN: 9789048162772

Paperback, [PU: Springer], This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in th… Meer...

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Daniel M. Dobkin; M. K. Zuraw:
Principles of Chemical Vapor Deposition - pocketboek

2010, ISBN: 9789048162772

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Softcover reprint of hardcover 1st ed. 2003, Softcover, Buch, [PU: Springer]

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Principles of Chemical Vapor Deposition

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Gedetalleerde informatie over het boek. - Principles of Chemical Vapor Deposition


EAN (ISBN-13): 9789048162772
ISBN (ISBN-10): 9048162777
Gebonden uitgave
pocket book
Verschijningsjaar: 2010
Uitgever: Springer-Verlag/Sci-Tech/Trade
288 Bladzijden
Gewicht: 0,439 kg
Taal: eng/Englisch

Boek bevindt zich in het datenbestand sinds 2012-11-13T15:07:08+01:00 (Amsterdam)
Detailpagina laatst gewijzigd op 2019-05-06T09:37:45+02:00 (Amsterdam)
ISBN/EAN: 9789048162772

ISBN - alternatieve schrijfwijzen:
90-481-6277-7, 978-90-481-6277-2


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