2010, ISBN: 9789048162772

Buch, Softcover, 1st ed. Softcover of orig. ed. 2003, Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, an… Meer...

Buch, Softcover, 1st ed. Softcover of orig. ed. 2003, Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding. [PU: Springer], Seiten: 273, Springer, 2010<

2010, ISBN: 9789048162772

pocketboek, gebonden uitgave

gewerbliches Angebot, [SC: 0.00], Neuware, [PU: Springer Netherland], 288, [GW: 441g], [ED: Taschenbuch], Softcover reprint of hardcover 1st edition 2003, DE, Principles of Chemical Vapor… Meer...

gewerbliches Angebot, [SC: 0.00], Neuware, [PU: Springer Netherland], 288, [GW: 441g], [ED: Taschenbuch], Softcover reprint of hardcover 1st edition 2003, DE, Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical..., Banküberweisung, PayPal, [CT: Sonstiges / Sonstiges]<

ISBN: 9789048162772

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the b… Meer...

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding. Media > Books, Springer Netherlands<

2010, ISBN: 9789048162772

auteur: Dobkin, D.M. auteur: Zuraw, M.K. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 2003, 284 Seiten, Publiziert: 2010-12-01T00:00:01Z, Produktgruppe: Book, Hers… Meer...

auteur: Dobkin, D.M. auteur: Zuraw, M.K. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 2003, 284 Seiten, Publiziert: 2010-12-01T00:00:01Z, Produktgruppe: Book, Hersteller-Nr.: Refer to Sapnet. 0.9 kg, Scheikunde, Techniek & transport, Categorieën, Boeken, Industriële, productie- & bedrijfsvoeringssystemen, Materialen & materiaalwetenschappen, Chemie, Wetenschap, natuur & wiskunde, Kernfysica, Natuurkunde, Engelstalige boeken, Featured Categories, Springer, 2010<

2010, ISBN: 9048162777

pocketboek, gebonden uitgave

Softcover reprint of hardcover 1st edition 2003 Kartoniert / Broschiert Atom- und Molekularphysik, Industrielle Chemie und Chemietechnologie, Fertigungstechnik und Ingenieurwesen, Devel… Meer...

Softcover reprint of hardcover 1st edition 2003 Kartoniert / Broschiert Atom- und Molekularphysik, Industrielle Chemie und Chemietechnologie, Fertigungstechnik und Ingenieurwesen, Development; Heat Transfer; Manufacturing; Natur; Physics; Pressure; Technologie; Transport; Vapor; chemistry; coating; metal, mit Schutzumschlag 11, [PU:Springer Netherlands; Springer Netherland]<