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Principles of Chemical Vapor Deposition (Paperback) - eerste uitgave

2010, ISBN: 9048162777

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[EAN: 9789048162772], Neubuch, [PU: Springer, Dordrecht], Paperback. Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phas… Meer...

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Principles of Chemical Vapor Deposition - pocketboek

2010, ISBN: 9048162777

[EAN: 9789048162772], Neubuch, [SC: 0.0], [PU: Springer Netherlands], NATUR; TECHNOLOGIE; CHEMISTRY; COATING; DEVELOPMENT; HEATTRANSFER; MANUFACTURING; METAL; PHYSICS; PRESSURE; TRANSPORT… Meer...

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Zuraw, M.K.;Dobkin, D.M.:
Principles of Chemical Vapor Deposition - pocketboek

2010

ISBN: 9789048162772

[ED: Softcover], [PU: Springer / Springer Netherlands], Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, … Meer...

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D.M. Dobkin; M.K. Zuraw:
Principles of Chemical Vapor Deposition - pocketboek

2010, ISBN: 9789048162772

Buch, Softcover, Softcover reprint of hardcover 1st ed. 2003, Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemi… Meer...

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Dobkin, D.M./ Zuraw, M.K.:
Principles of Chemical Vapor Deposition: What's Going on Inside the Reactor - pocketboek

2003, ISBN: 9789048162772

Springer Netherlands, 2003. Paperback. New. 284 pages. 8.80x6.00x0.60 inches., Springer Netherlands, 2003, 6

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Principles of Chemical Vapor Deposition

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Gedetalleerde informatie over het boek. - Principles of Chemical Vapor Deposition


EAN (ISBN-13): 9789048162772
ISBN (ISBN-10): 9048162777
Gebonden uitgave
pocket book
Verschijningsjaar: 2010
Uitgever: Springer
288 Bladzijden
Gewicht: 0,439 kg
Taal: eng/Englisch

Boek bevindt zich in het datenbestand sinds 2012-11-13T15:07:08+01:00 (Amsterdam)
Detailpagina laatst gewijzigd op 2024-01-05T18:20:54+01:00 (Amsterdam)
ISBN/EAN: 9789048162772

ISBN - alternatieve schrijfwijzen:
90-481-6277-7, 978-90-481-6277-2
alternatieve schrijfwijzen en verwante zoekwoorden:
Auteur van het boek: zura, dobkin


Gegevens van de uitgever

Auteur: D.M. Dobkin; M.K. Zuraw
Titel: Principles of Chemical Vapor Deposition
Uitgeverij: Springer; Springer Netherland
273 Bladzijden
Verschijningsjaar: 2010-12-01
Dordrecht; NL
Gedrukt / Gemaakt in
Gewicht: 0,454 kg
Taal: Engels
213,99 € (DE)
219,99 € (AT)
236,00 CHF (CH)
POD
XI, 273 p.

BC; Characterization and Evaluation of Materials; Hardcover, Softcover / Technik/Maschinenbau, Fertigungstechnik; Werkstoffprüfung; Verstehen; Natur; Technologie; chemistry; coating; development; heat transfer; manufacturing; metal; physics; pressure; transport; vapor; Industrial Chemistry/Chemical Engineering; Manufacturing, Machines, Tools, Processes; Nuclear Physics, Heavy Ions, Hadrons; Characterization and Analytical Technique; Industrial Chemistry; Machines, Tools, Processes; Nuclear Physics; Industrielle Chemie und Chemietechnologie; Fertigungstechnik und Ingenieurwesen; Atom- und Molekularphysik; BB

Acknowledgements. Preface. 1: Introduction. 1. What's behind the facade? 2. Generic reactors and process considerations. 3. Tube and showerhead reactor examples. 2: Reactors without transport. 1. What goes in must go somewhere: Measuring gases. 2. Review: Kinetic theory. 3. The zero-dimensional reactor. 4. Zero-dimensional tube and showerhead examples. 3: Mass transport. 1. Introduction to transport. 2. Convection and diffusion. 3. Diffusion: Physics and math. 4. Fluid flow and convective transport. 5. When flows matter: The Knudsen number. 6. Tube and showerhead examples. 7. On to photons. 4: Heat transport. 1. What is heat (energy) transport? 2. Heat conduction and diffusion. 3. Convective heat transfer made (very) simple. 4. Natural convection. 5. Radiative heat transfer. 6. Temperature measurement. 7. Tube and showerhead examples. 5: Chemistry for CVD. 1. What does the C stand for anyway? 2. Volatility, the V in CVD. 3. Equilibrium: Where things are going. 4. Kinetics: The slowest step wins. 5. Real precursors for real films. 6. Tube reactor example. 7. A few final remarks. 6: Gas discharge plasmas for CVD. 1. Plasma discharges: An instant review. 2. The low-pressure cold-plasma state. 3. Key parameters for capacitive plasma state. 4. Alternative excitation methods. 5. Plasmas for deposition. 6. Plasma damage. 7. Technical details. 8. Ongoing example: Parallel plate reactor. 9. A remark on computational tools. 7: CVD films. 1. Why CVD? 2. Silicon dioxide. 3. Silicon nitride. 4. Tantalum pentoxide. 5. Metal deposition by CVD. 6. Concluding remarks. 8: CVD reactors. 1. CVD reactor configurations. 2. Tube reactors. 3. Showerhead reactors. 4. High density plasma reactors. 5. Injector-based atmospheric pressure reactors. 6. Reactor conclusions. Index.

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