MONSTER
Chiang, Charles Kawa, Jamil:Design for Manufacturability and Yield for Nano-Scale CMOS
- pocketboek 2010, ISBN: 9789048173037
[ED: Softcover], [PU: Springer Netherlands], This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a S… Meer...
[ED: Softcover], [PU: Springer Netherlands], This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development. As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect ratio metallurgies. This reality has resulted in three main manufacturability issues that have to be addressed: printability, planarization, and intra-die variability. Addressing in depth the fundamentals impacting those three issues at all the stages of the design process is not a luxury one can ignore. Manufacturability and yield are now one and the same and are no longer a fabrication, packaging, and test concerns they are the concern of the whole IC community. Yield and manufacturability have to be designed in, and they are everybody s responsibility. Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
2010. xxvii, 255 S. 235 mm
Versandfertig in 6-10 Tagen, DE, [SC: 0.00], Neuware, gewerbliches Angebot, Offene Rechnung (Vorkasse vorbehalten)<
| | booklooker.debuecher.de GmbH & Co. KG Verzendingskosten:Versandkostenfrei, Versand nach Deutschland. (EUR 0.00) Details... |
(*) Uitverkocht betekent dat het boek is momenteel niet beschikbaar op elk van de bijbehorende platforms we zoeken.
MONSTER
Charles Chiang:Design for Manufacturability and Yield for Nano-Scale CMOS
- pocketboek 2010, ISBN: 9048173035
[EAN: 9789048173037], Neubuch, [SC: 0.0], [PU: Springer Netherlands], Druck auf Anfrage Neuware - This book walks the reader through all the aspects of manufacturability and yield in a na… Meer...
[EAN: 9789048173037], Neubuch, [SC: 0.0], [PU: Springer Netherlands], Druck auf Anfrage Neuware - This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development. As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect ratio metallurgies. This reality has resulted in three main manufacturability issues that have to be addressed: printability, planarization, and intra-die variability. Addressing in depth the fundamentals impacting those three issues at all the stages of the design process is not a luxury one can ignore. Manufacturability and yield are now one and the same and are no longer a fabrication, packaging, and test concerns; they are the concern of the whole IC community. Yield and manufacturability have to be designed in, and they are everybody s responsibility.Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development. 288 pp. Englisch, Books<
| | ZVAB.comAHA-BUCH GmbH, Einbeck, Germany [51283250] [Rating: 5 (von 5)] NEW BOOK. Verzendingskosten:Versandkostenfrei. (EUR 0.00) Details... |
(*) Uitverkocht betekent dat het boek is momenteel niet beschikbaar op elk van de bijbehorende platforms we zoeken.
MONSTER
Charles Chiang:Design for Manufacturability and Yield for Nano-Scale CMOS
- pocketboek 2010, ISBN: 9048173035
[EAN: 9789048173037], Neubuch, [PU: Springer Netherlands], Druck auf Anfrage Neuware - This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS pro… Meer...
[EAN: 9789048173037], Neubuch, [PU: Springer Netherlands], Druck auf Anfrage Neuware - This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development. As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect ratio metallurgies. This reality has resulted in three main manufacturability issues that have to be addressed: printability, planarization, and intra-die variability. Addressing in depth the fundamentals impacting those three issues at all the stages of the design process is not a luxury one can ignore. Manufacturability and yield are now one and the same and are no longer a fabrication, packaging, and test concerns; they are the concern of the whole IC community. Yield and manufacturability have to be designed in, and they are everybody s responsibility.Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development. 288 pp. Englisch, Books<
| | AbeBooks.deAHA-BUCH GmbH, Einbeck, Germany [51283250] [Rating: 5 (von 5)] NEW BOOK. Verzendingskosten:Versandkostenfrei. (EUR 0.00) Details... |
(*) Uitverkocht betekent dat het boek is momenteel niet beschikbaar op elk van de bijbehorende platforms we zoeken.
MONSTER
Design for Manufacturability and Yield for Nano-Scale CMOS
- nieuw boekISBN: 9789048173037
Design for Manufacturability and Yield for Nano-Scale CMOSwalks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at … Meer...
Design for Manufacturability and Yield for Nano-Scale CMOSwalks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design''s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development. Books List_Books<
| | Indigo.canew in stock. Verzendingskosten:zzgl. Versandkosten., exclusief verzendingskosten Details... |
(*) Uitverkocht betekent dat het boek is momenteel niet beschikbaar op elk van de bijbehorende platforms we zoeken.
Chiang, Charles:Design for Manufacturability and Yield for Nano-Scale CMOS (Integrated Circuits and Systems)
- pocketboek 2010, ISBN: 9789048173037
Mitwirkende: Kawa, Jamil, Springer, Taschenbuch, Auflage: Softcover reprint of hardcover 1st ed. 2007, 288 Seiten, Publiziert: 2010-11-22T00:00:01Z, Produktgruppe: Buch, Hersteller-Nr.: b… Meer...
Mitwirkende: Kawa, Jamil, Springer, Taschenbuch, Auflage: Softcover reprint of hardcover 1st ed. 2007, 288 Seiten, Publiziert: 2010-11-22T00:00:01Z, Produktgruppe: Buch, Hersteller-Nr.: biography, 1 kg, CAD & CAM, Grafik & Multimedia, Computer & Internet, Kategorien, Bücher, Informatik, IT-Ausbildung & -Berufe, Softwareentwicklung, Elektrotechnik, Ingenieurwissenschaft & Technik, Naturwissenschaften & Technik, Verschiedenes, Springer, 2010<
| | Amazon.de (Intern...Amazon.de Verzendingskosten:Auf Lager. Lieferung von Amazon. (EUR 0.00) Details... |
(*) Uitverkocht betekent dat het boek is momenteel niet beschikbaar op elk van de bijbehorende platforms we zoeken.