- 5 resultaten
laagste prijs: € 316,32, hoogste prijs: € 571,84, gemiddelde prijs: € 416,20
1
Advances in Rapid Thermal and Integrated Processing - F. Roozeboom
bestellen
bij AbeBooks.co.uk
£ 352,61
(ongeveer € 405,16)
verzending: € 9,591
bestellenGesponsorde link
F. Roozeboom:

Advances in Rapid Thermal and Integrated Processing - pocketboek

2010, ISBN: 9048146968

[EAN: 9789048146963], New book, [SC: 9.59], [PU: Springer Netherlands Dez 2010], METALL; SEMICONDUCTOR; ELECTRICALENGINEERING; MATERIALSSCIENCE; SEMICONDUCTORS; THINFILM, This item is pri… Meer...

NEW BOOK. Verzendingskosten: EUR 9.59 BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany [57449362] [Rating: 5 (of 5)]
2
Advances in Rapid Thermal and Integrated Processing (NATO Science Series E:, 318)
bestellen
bij amazon.com
$ 338,53
(ongeveer € 316,32)
verzending: € 15,841
bestellenGesponsorde link
Advances in Rapid Thermal and Integrated Processing (NATO Science Series E:, 318) - pocketboek

2010, ISBN: 9789048146963

Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...

Verzendingskosten:Real shipping costs can differ from the ones shown here. (EUR 15.84)
3
Advances in Rapid Thermal and Integrated Processing (NATO Science Series E:, 318)
bestellen
bij amazon.com
$ 368,00
(ongeveer € 343,86)
verzending: € 14,011
bestellenGesponsorde link
Advances in Rapid Thermal and Integrated Processing (NATO Science Series E:, 318) - pocketboek

2010

ISBN: 9789048146963

Editor: Roozeboom, F. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1996, 578 Seiten, Publiziert: 2010-12-04T00:00:01Z, Produktgruppe: Book, 0.8 kg, Semiconductors,… Meer...

Verzendingskosten:In Stock, Lieferung von Amazon. (EUR 14.01) Amazon.com
4
bestellen
bij Biblio.co.uk
$ 623,94
(ongeveer € 571,84)
verzending: € 19,251
bestellenGesponsorde link
F. Roozeboom (Editor):
Advances in Rapid Thermal and Integrated Processing (Nato Science Series E: (closed)) - pocketboek

2010, ISBN: 9789048146963

gebonden uitgave

Springer, 2010-12-03. Softcover reprint of hardcover 1. Paperback. Used:Good., Springer, 2010-12-03, 0

Verzendingskosten: EUR 19.25 Ergodebooks
5
bestellen
bij AbeBooks.co.uk
£ 386,26
(ongeveer € 443,82)
verzending: € 60,051
bestellenGesponsorde link
Advances in Rapid Thermal and Integrated Processing (NATO Science Series E:, 318) - pocketboek

2010, ISBN: 9048146968

[EAN: 9789048146963], New book, [SC: 60.05], [PU: Springer], Books

NEW BOOK. Verzendingskosten: EUR 60.05 Lucky's Textbooks, Dallas, TX, U.S.A. [60577173] [Rating: 5 (of 5)]

1Aangezien sommige platformen geen verzendingsvoorwaarden meedelen en deze kunnen afhangen van het land van levering, de aankoopprijs, het gewicht en de grootte van het artikel, een eventueel lidmaatschap van het platform, een rechtstreekse levering door het platform of via een derde aanbieder (Marktplaats), enz., is het mogelijk dat de door euro-boek.nl meegedeelde verzendingskosten niet overeenstemmen met deze van het aanbiedende platform.

Bibliografische gegevens van het best passende boek

Bijzonderheden over het boek
Advances in Rapid Thermal and Integrated Processing (NATO Science Series E:, 318)

Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.

Gedetalleerde informatie over het boek. - Advances in Rapid Thermal and Integrated Processing (NATO Science Series E:, 318)


EAN (ISBN-13): 9789048146963
ISBN (ISBN-10): 9048146968
Gebonden uitgave
pocket book
Verschijningsjaar: 2010
Uitgever: Springer
580 Bladzijden
Gewicht: 0,865 kg
Taal: eng/Englisch

Boek bevindt zich in het datenbestand sinds 2012-11-07T18:53:56+01:00 (Amsterdam)
Detailpagina laatst gewijzigd op 2023-11-23T23:55:55+01:00 (Amsterdam)
ISBN/EAN: 9048146968

ISBN - alternatieve schrijfwijzen:
90-481-4696-8, 978-90-481-4696-3
alternatieve schrijfwijzen en verwante zoekwoorden:
Titel van het boek: rapid


Gegevens van de uitgever

Auteur: F. Roozeboom
Titel: NATO Science Series E:; Advances in Rapid Thermal and Integrated Processing
Uitgeverij: Springer; Springer Netherland
566 Bladzijden
Verschijningsjaar: 2010-12-04
Dordrecht; NL
Gedrukt / Gemaakt in
Gewicht: 0,878 kg
Taal: Engels
427,99 € (DE)
439,99 € (AT)
472,00 CHF (CH)
POD
XII, 566 p.

BC; Solid State Physics; Hardcover, Softcover / Physik, Astronomie/Atomphysik, Kernphysik; Physik der kondensierten Materie (Flüssigkeits- und Festkörperphysik); Verstehen; Metall; Semiconductor; electrical engineering; materials science; semiconductors; thin film; Spectroscopy and Microscopy; Optical and Electronic Materials; Characterization and Evaluation of Materials; Condensed Matter Physics; Spectroscopy; Optical Materials; Characterization and Analytical Technique; Spektroskopie, Spektrochemie, Massenspektrometrie; Technische Anwendung von elektronischen, magnetischen, optischen Materialien; Werkstoffprüfung; BB

Preface. 1. Introduction: History and Perspectives of Rapid Thermal Processing; F. Roozeboom. 2. The Thermal Radiative Properties of Semiconductors; P.J. Timans. 3. Wafer Temperature Measurement in RTP; C. Schietinger. 4. Wafer Emissivity in RTP; C. Schietinger. 5. Temperature and Process Control in Rapid Thermal Processing; J.-M. Dilhac. 6. Single-Wafer Process Integration and Process Control Techniques; M.M. Moslehi, et al. 7. Rapid Thermal O2-Oxidation and N2-Oxynitridation; M.L. Green. 8. Integrated Pre-Gate Dielectric Cleaning and Surface Preparation; Y. Ma, M.L. Green. 9. Dielectric Photoformation on Si and SiGe; I.W. Boyd. 10. Modeling Strategies for Rapid Thermal Processing: Finite Element and Monte Carlo Methods; K.F Jensen, et al. 11. Modeling Approaches for Rapid Thermal Chemical Vapor Deposition: Combining Transport Phenomena with Chemical Kinetics; K.F. Jensen, et al. 12. Silicidation and Metallization Issues Using Rapid Thermal Processing; K. Maex. 13. Rapid Thermal Multiprocessing for a Programmable Factory for Manufacturing of ICs; K.C. Saraswat. 14. RTCVD Integrated Processing for Photovoltaic Application; E. Conrad, et al. 15. Equipment Design, Cluster Tools and Scale-up Issues; L. Deutschmann, et al. 16. Rapid Thermal Chemical Vapour Deposition of Epitaxial Si and SiGe: Low Temperature Epitaxy in Production; W.B. de Boer. 17. The Evolving Role of Rapid Thermal Processing for Deep Submicron Devices; B. Lojek. 18. Rapid Thermal Processing of Contacts and Buffer Layers for Compound Semiconductor Device Technology; A. Christou, et al. 19. Rapid Thermal Processing of Magnetic Thin Films for Data Storage Devices; F. Roozeboom. Appendix. Subject Index.
Proceedings of the NATO Advanced Study Institute, Acquafredda di Maratea, Italy, July 3-14, 1995

Andere boeken die eventueel grote overeenkomsten met dit boek kunnen hebben:

Laatste soortgelijke boek:
9789401587112 Advances in Rapid Thermal and Integrated Processing (F. Roozeboom)


< naar Archief...